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PXY 200 D12

Description

The piezo positioning PXY 200 D12 stage was developed for STM and AFM applications. This nanopositioner is optimized for high resonant frequencies and high stiffness in both axes. It was designed for typical line scanning applications, where quick and precise line movements and positioning is required.

The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.

For special applications, the nanopositioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.

Technical Data

UNITPXY 200 D12PXY 200 D12 SGPXY 200 D12 CAP
Part #S-605-20S-605-21S-605-26
AxisX, YX, YX, Y
Motion in Open Loop (±10%)*μm200200200
Motion in Closed Loop (±0.2%)*μm160160
Resolution Open Loop**nm0.4
Resolution Closed Loop**nm41
Dimensions (L x W x H)mm57.5 x 64 x 1657.5 x 64 x 1675.5 x 69 x 27
Weightg160160225
*Typical value measured with a NV 40/3 amplifier (closed loop: NV 40/3 CLE amplifier). **The resolution is only limited by the noise of the power amplifier and metrology.

PXY 80 D12

Description

The piezo positioning PXY 80 D12 stage was developed for STM and AFM applications. This nano-positioner is optimized for high resonant frequencies and high stiffness in both axes. It was designed for typical line scanning applications, where quick and precise line movements and positioning is required.

The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.

For special applications, the nano-positioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.

Technical Data

UNITPXY 80 D12PXY 80 D12 SGPXY 80 D12 CAP
Part #S-605-10S-605-14S-605-16
AxisX, YX, YX, Y
Motion in Open Loop (±10%)*μm808080
Motion in Closed Loop (±0.2%)*μm6565
Resolution Open Loop**nm0.16
Resolution Closed Loop**nm1.61
Dimensions (L x W x H)mm54 x 53.5 x 1654 x 53.5 x 1664 x 63.5 x 22
Weightg9090155
*Typical value measured with a NV 40/3 amplifier (closed loop: NV 40/3 CLE amplifier). **The resolution is only limited by the noise of the power amplifier and metrology.

PXY 40 D12

Description

The piezo positioning PXY 40 D12 stage was developed for STM and AFM applications. This nanopositioner is optimized for high resonant frequencies and high stiffness in both axes. It was designed for typical line scanning applications, where quick and precise line movements and positioning is required.

The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.

For special applications, the nanopositioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.

Technical Data

UNITPXY 40 D12
Part #S-605-37
AxisX, Y
Motion in Open Loop (±10%)*μm40
Resolution Open Loop**nm0.08
Dimensions (L x W x H)mm54 x 53.5 x 20
Weightg90
*Typical value measured with a NV 40/3 amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.

nanoSXY 400

Description

The nanoSXY 400 combines the high accuracy and speed of a piezo positioning system with a special actuating design for long travel motion. The stage offers a compact design with a height of only 20 mm, outside dimensions of only 60 x 60 mm, and a free center space of 12.5 mm.

The ultra flat design of the stage and the easy ability to combine it with an XY scanning system, makes the system especially useful for a wide variety of applications.

Based on the unique bi-directional actuating nanoX design, the nanoSXY 400 can move high load masses with a resolution of 0.6 nm. The design also guarantees excellent guidance accuracy without parasitic motion and improves the settling time actively. The stage can be equipped with a high resolution feedback system for closed loop control.

Fields of application include high resolution metrology, X and XY scanning, and dynamic positioning. The stages are also available in cryogenic and vacuum versions.

Technical Data

UNITnanoSXY 400nanoSXY 400 CAP
Part #T-224-00T-224-06
AxisX, YX, Y
Motion in Open Loop (±10%)*μm400400
Motion in Closed Loop (±0,2%)*μm320
Resolution Open Loop**nm0.80.8
Resolution Closed Loop**nm1.0
Dimensions (L x W x H)mm60 x 60 x 2060 x 82 x 30
Weightg300410
*Typical value measured with a 30V300 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.

nanoSXY 120

Description

The nanoSXY 120 combines the high accuracy and speed of a piezo positioning system with a special actuating design for long travel motion. The stage offers a compact design with a height of only 20 mm, outside dimensions of only 60 x 60 mm, and a free center space of 12.5 mm.

The ultra flat design of the stage and the easy ability to combine it with an XY scanning system, makes the system especially useful for a wide variety of applications.

Based on the unique bi-directional actuating nanoX design, the nanoSXY 120 can move high load masses with a resolution of 0.25 nm. The design also guarantees excellent guidance accuracy without parasitic motion and improves the settling time actively. The stage can be equipped with a high resolution feedback system for closed loop control.

Fields of application include high resolution metrology, X and XY scanning, and dynamic positioning. The stages are also available in cryogenic and vacuum versions.

Technical Data

UNITnanoSXY 120nanoSXY 120 CAP
Part #T-223-00T-223-06
AxisX, YX, Y
Motion in Open Loop (±10%)*μm120
Motion in Closed Loop (±0,2%)*μm100
Resolution Open Loop**nm0.24
Resolution Closed Loop**nm1.0
Dimensions (L x W x H)mm60 x 60 x 2060 x 87 x 30
Weightg250350
*Typical value measured with a 30V300 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.