The piezo positioning PXY 200 D12 stage was developed for STM and AFM applications. This nano-positioner is optimized for high resonant frequencies and high stiffness in both axes. It was designed for typical line scanning applications, where quick and precise line movements and positioning is required.
The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.
For special applications, the nanopositioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.
Technical Data
UNIT
PXY 200 D12
PXY 200 D12 SG
PXY 200 D12 CAP
Part #
S-605-20
S-605-21
S-605-26
Axis
X, Y
X, Y
X, Y
Motion in Open-Loop (±10%)*
μm
200
200
200
Motion in Closed-Loop (±0.2%)*
μm
–
160
160
Resolution Open-Loop**
nm
0.4
–
–
Resolution Closed-Loop**
nm
–
4
1
Dimensions (L x W x H)
mm
57.5 x 64 x 16
57.5 x 64 x 16
75.5 x 69 x 27
Weight
g
160
160
225
*Typical value measured with a NV 40/3 amplifier (closed-loop: NV 40/3 CLE amplifier). **The resolution is only limited by the noise of the power amplifier and metrology.
The piezo positioning PXY 80 D12 stage was developed for STM and AFM applications. This nano-positioner is optimized for high resonant frequencies and high stiffness in both axes. It is designed for typical line scanning applications, where quick and precise line movements and positioning is required.
The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.
For special applications, the nano-positioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.
Technical Data
UNIT
PXY 80 D12
PXY 80 D12 SG
PXY 80 D12 CAP
Part #
S-605-10
S-605-14
S-605-16
Axis
X, Y
X, Y
X, Y
Motion in Open-Loop (±10%)*
μm
80
80
80
Motion in Closed-Loop (±0.2%)*
μm
–
65
65
Resolution Open-Loop**
nm
0.16
–
–
Resolution Closed-Loop**
nm
–
1.6
1
Dimensions (L x W x H)
mm
54 x 53.5 x 16
54 x 53.5 x 16
64 x 63.5 x 22
Weight
g
90
90
155
*Typical value measured with a NV 40/3 amplifier (closed-loop: NV 40/3 CLE amplifier). **The resolution is only limited by the noise of the power amplifier and metrology.
The piezo positioning PXY 40 D12 stage was developed for STM and AFM applications. This nanopositioner is optimized for high resonant frequencies and high stiffness in both axes. It was designed for typical line scanning applications, where quick and precise line movements and positioning is required.
The short settling time after a jump or a change of position was a key design goal. Piezo based electrical actuators and piezo-mechanic stages are well known for high resolution movement and long term positioning stability.
For special applications, the nanopositioner can be optimized for minimum deviation in the Z direction while moving in the X and Y directions.
Technical Data
UNIT
PXY 40 D12
Part #
S-605-37
Axis
X, Y
Motion in Open Loop (±10%)*
μm
40
Resolution Open Loop**
nm
0.08
Dimensions (L x W x H)
mm
54 x 53.5 x 20
Weight
g
90
*Typical value measured with a NV 40/3 amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.
The nanoSXY 400 combines the high accuracy and speed of a piezo positioning system with a special actuating design for long travel motion. The stage offers a compact design with a height of only 20 mm, outside dimensions of only 60 x 60 mm, and a free center space of 12.5 mm.
The ultra flat design of the stage and the easy ability to combine it with an XY scanning system, makes the system especially useful for a wide variety of applications.
Based on the unique bi-directional actuating nanoX design, the nanoSXY 400 can move high load masses with a resolution of 0.6 nm. The design also guarantees excellent guidance accuracy without parasitic motion and improves the settling time actively. The stage can be equipped with a high resolution feedback system for closed-loop control.
Fields of application include high resolution metrology, X and XY scanning, and dynamic positioning. The stages are also available in cryogenic and vacuum versions.
Technical Data
UNIT
nanoSXY 400
nanoSXY 400 CAP
Part #
T-224-00
T-224-06
Axis
X, Y
X, Y
Motion in Open-Loop (±10%)*
μm
400
400
Motion in Closed-Loop (±0,2%)*
μm
–
320
Resolution Open-Loop**
nm
0.8
0.8
Resolution Closed-Loop**
nm
–
1.0
Dimensions (L x W x H)
mm
60 x 60 x 20
60 x 82 x 30
Weight
g
300
410
*Typical value measured with a 30V300 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.
The nanoSXY 120 combines the high accuracy and speed of a piezo positioning system with a special actuating design for long travel motion. The stage offers a compact design with a height of only 20 mm, outside dimensions of only 60 x 60 mm, and a free center space of 12.5 mm.
The ultra flat design of the stage and the easy ability to combine it with an XY scanning system, makes the system especially useful for a wide variety of applications.
Based on the unique bi-directional actuating nanoX design, the nanoSXY 120 can move high load masses with a resolution of 0.25 nm. The design also guarantees excellent guidance accuracy without parasitic motion and improves the settling time actively. The stage can be equipped with a high resolution feedback system for closed-loop control.
Fields of application include high resolution metrology, X and XY scanning, and dynamic positioning. The stages are also available in cryogenic and vacuum versions.
Technical Data
UNIT
nanoSXY 120
nanoSXY 120 CAP
Part #
T-223-00
T-223-06
Axis
X, Y
X, Y
Motion in Open-Loop (±10%)*
μm
120
–
Motion in Closed-Loop (±0,2%)*
μm
–
100
Resolution Open-Loop**
nm
0.24
–
Resolution Closed-Loop**
nm
–
1.0
Dimensions (L x W x H)
mm
60 x 60 x 20
60 x 87 x 30
Weight
g
250
350
*Typical value measured with a 30V300 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.