nanoMIPOS 400

  • 400 µm focusing range and sub-nm step width
  • Maximum lens diameter of 39 mm
  • Temperature compensated
  • Short settling time due to high stiffness
  • Universal thread adapters
  • Optional integrated capacitance feedback sensor
  • Applicable for standard and inverse microscopy
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nanoMIPOS 400 – Description

This nanoMIPOS offers a nano-positioning and scanning range up to 400 µm in open-loop operation, as well as 320 µm in closed-loop. The system can be assembled with objectives of up to 39 mm in diameter.

The sophisticated monolithic guidance design, consisting of solid flexure hinges, means the trajectory is free of mechanical play and friction – a feature offered by all piezosystem jena stages.

The advanced nanoMIPOS 400 design is FEA optimized to show an outstanding minimum of lateral and rotational offset, as well as excellent guidance accuracy, while offering robustness against off center and lateral loads.

To avoid drift and hysteresis, the nanoMIPOS 400 can be equipped with a capacitive measurement system. In combination with the piezosystem jena controller, this system offers high stability, linearity, repeatability and accuracy in closed loop operation.

Technical Data

Part # for threadM25 x 0.75O-543-00O-543-06
W0.8 x 1/36″ (RMS)O-544-00O544-06
M26 x 0.75O-545-00O-545-06
M27 x 0.75O-546-00O-546-06
Motion in Open-Loop (±10%)*μm400400
Motion in Closed-Loop (±0,2%)*μm320
Resolution Open-Loop**nm0.80.8
Resolution Closed-Loop**nm1
Dimensions (L x W x H)mm65 x 45 x 4065 x 45 x 40
*Typical value measured with a 30DV50 nanoX amplifier. **The resolution is only limited by the noise of the power amplifier and metrology.

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